Determination of alkaline component in photoresist remover solution (Determination of carbonates with barium chloride addition method) | Autotitrator COM-A19 - JM Science

Determination of alkaline component in photoresist remover solution (Determination of carbonates with barium chloride addition method) | Autotitrator COM-A19

Electric & Electronics

Strong alkaline solution is used as remover for residual photoresist on the substrate after the development of the substrate for liquid crystal display instrument etc. The composition depends on the intended use but sodium hydroxide, potassium hydroxide, and tetramethylammonium hydroxide (TMAH) are used as remover.

TMAH can be determined by potentiometric titration with hydrochloric acid standard solution. TMAH could absorb carbon dioxide gas and generate carbonates, it indicates another inflection point at pH around 4 on the titration with hydrochloric acid standard solution. This report introduces an example of fractional determination for TMAH and carbonates.

Determination of alkaline component in photoresist remover solution | Autotitrator COM-A19 - JM Science

Determination of alkaline component in photoresist remover solution | Autotitrator COM-A19

Electric & Electronics

Strong alkaline solution is used as remover for residual photoresist on the substrate after the development of the substrate for liquid crystal display instrument etc. The composition depends on the intended use but sodium hydroxide, potassium hydroxide, and tetramethylammonium hydroxide (TMAH) are used as remover.

TMAH can be determined by potentiometric titration with hydrochloric acid standard solution. TMAH could absorb carbon dioxide gas and generate carbonates, it indicates another inflection point at pH around 4 on the titration with hydrochloric acid standard solution. This report introduces an example of fractional determination for TMAH and carbonates.

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